PRODUCTS
SLURRY BLENDING AND DISTRIBUTION SYSTEMS
Celerity offers complete solutions for slurry blending and distribution for the semiconductor fab. Our CMP slurry blending and distribution, particle size characterization, and post-CMP cleaning product technologies provide a complete single source solution for semiconductor manufacturers. Combined with our complete technology offering of chemical analysis and real time replenishment, we offer IC manufacturers significant competitive advantage utilizing state-of-the-art process control in CMP polishing. On an ongoing basis, we apply our extensive knowledge and experience with slurry chemistries to new applications such as copper and STI CMP and focus our resources to provide the best solutions for our customers.
As new slurry formulations are offered to the market (for 90nm processes and beyond), our dedicated, industry-recognized research and development laboratory will evaluate the effect of blending and distribution of these materials to end user's specifications. This group continually works with the leading slurry materials suppliers and industry process engineers to benchmark and, if necessary, modify our equipment designs to bring the industry "best in class" equipment and processes for these new slurry materials.
MegaFlow™
MegaFlow series of slurry blend & distribution systems are designed for CMP applications such as silicon and polysilicon, oxide/dielectric, STI, tungsten, and copper for small to large-scale use. Advanced design features and instrumentation for slurry qualification and monitoring provide unmatched performance and value for our customers.
MegaFlow models include:
- MegaFlow II - Large Fabscale polisher lines
- MegaFlow IIIB - Small & medium polisher lines
- MegaFlow IIIC - Medium & large polisher lines
- MegaFlow V - High mixtank makeup rates
- MegaFlow VI - Medium to high volume production
DynaBlend™
Precision in-line dynamic slurry blending system with compact and modular design architecture. Ideal for point-of-use applications.
topMegaTrend™
The MegaTrend series of products supplies accurate and repeatable metrology for slurry and chemical blends. This product line compliments Celerity MegaFlow and MegaBlend lines of equipment to provide customers with state-of-the-art blend qualification.
MegaTrend product lines include:
- Auto Titration and Replenishment System (ATRS)
The ATRS provides analysis and replenishment of the hydrogen peroxide concentration in blended slurries, as a result extending the pot-life and improving polishing performance. - Slurry Metrology Sensor Package (SMSP)
The Slurry Metrology Sensor Package is an on-line system that monitors particle size distribution for CMP slurries. Past research in process monitoring demonstrates the importance of maintaining a uniform particle size distribution within a slurry delivery system.
ConSensor™
The ConSensor monitors and maintains the concentration of an oxidizer, such as hydrogen peroxide, in a CMP slurry blend.
topTECHNOLOGIES
Celerity proprietary technologies for liquid process modules.
InFlo™ technology enables precise liquid flow control.
Spectrym™ technology enables concentration specific monitoring of chemicals.
Particle characterization technology ensures process integrity by tracking particle size and distribution.