PRODUCTS
GAS DELIVERY MODULES
PTI Module

Our PTI module provides several process and cost of ownership benefits over conventional gas delivery systems. The PTI technology enables precise and repeatable flow control and output under adverse conditions. The module's proprietary hardware and control algorithms mitigate the effects of upstream pressure instability and eliminate the need for additional line pressure regulation.
The PTI module employs our Step™ technology for fast response to control commands, resulting in improved wafer processing throughput. The embedded MultiFlo™ technology reduces cost of ownership through decreased inventories, shorter mean time to repair (MTTR), and less tool downtime.
Benefits include:
- Increases flow stability with embedded PTI technology
- Fast response to control setpoint with Step Technology
- Flexibility in reconfiguration of gases an ranges with MultiFlo technology
- Reduces inventory requirements
- Reduces footprint
- Reduces cost of ownership
Rate-of-Rise Module
Utilizing proprietary hardware and software algorithms, our Rate-of-Rise module provides in-situ verification and calibration of gas delivery. Our Rate-of-Rise technology removes the inherent problems associated with process chamber rate-of-rise validation methods. The module is unique, in that it both validates and provides calibration of the gas delivery system, eliminating manual intervention. We are capable of integrating our Rate-of-Rise module into customer-specific designs to provide a smaller, better performing solution over existing design technologies.
topRatio Flow Splitter Module

Our Ratio Flow Splitter (RFS) module precisely splits the incoming flow of gas into a user-defined ratio for delivery into multiple zones of a process chamber. This enables precise, repeatable distribution of gas across the wafer, resulting in improved thin film uniformity and consistency.
Utilizing application specific hardware and consolidated control electronics, the RFS module enables greater control over semiconductor manufacturing processes while reducing the complexity and footprint compared to competing solutions. This configurable and programmable control system offers repeatable edge-to-center substrate uniformity, and is available on multiple OEM platforms.
Benefits include:
- Very low pressure drop (250 torr)
- Fast system response
- Accurate and repeatable across a wide range of gas ratios
- Small footprint
TECHNOLOGIES



MultiFlo™ technology is an N2-calibrated, gas and range configurable flow control solution.
PTI technology utilizes a dual sensor controller to compensate for yield-impacting pressure transients.
Step™ technology enables fast setpoint control response through an optimize sensor drive.